平面的
MOSFET
拓扑(电路)
电容
材料科学
六方晶系
功率MOSFET
功率(物理)
网络拓扑
光电子学
电气工程
电子工程
计算机科学
物理
工程类
化学
结晶学
晶体管
电极
计算机图形学(图像)
量子力学
电压
操作系统
作者
Shengnan Zhu,Tianshi Liu,Arash Salemi,Michael Jin,Marvin H. White,David C. Sheridan,Anant Agarwal
标识
DOI:10.1109/wipda56483.2022.9955263
摘要
A new Dodecagonal (polygon with twelve sides, short for Dod) cell topology is designed for 4H-SiC planar power MOSFETs. The Dod cell is used in the layout design of the 650 V SiC MOSFETs. The nominal Hexagonal (Hex) cell and a recently published Octagonal (Oct) cell are also used on the 650 V SiC MOSFET layout designs for comparisons. The devices are fabricated, diced, and packaged for static and dynamic characterizations. Experimental results show that the Hex-cell MOSFET has the lowest specific ON-resistance (R on,sp ) and is suitable for high-power applications. The Dod and Oct-cell MOSFETs have much smaller gate-drain capacitance than Hex-cell MOSFETs, making them good candidates for high-frequency applications. The new Dod cell is designed with optimized channel density to have reduced R on,sp compared to the Oct cell.
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