吸收剂量
电离辐射
MOSFET
功率MOSFET
光电子学
材料科学
辐射
灵敏度(控制系统)
降级(电信)
电压
电气工程
辐照
物理
电子工程
工程类
核物理学
晶体管
作者
Min Ren,Wenjing He,Wei Gao,Shao-Feng Cai,Zehong Li,Jinping Zhang,Bo Zhang
标识
DOI:10.1109/icsict.2018.8565774
摘要
The effects of Total Ionizing Dose (TID) radiation on the cells and terminations of Superjunction MOSFET (SJ-MOS) and conventional power MOSFET (C-MOS) were studied by simulations, respectively. The same degradation trends in electrical parameters were found for the cells of these two devices; however, the breakdown voltage (BV) of the termination region in SJ-MOS shows much less sensitivity to TID radiation. The reason why SJ-MOS has a superior TID endurance is discussed in detail.
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