氧化钇稳定氧化锆
材料科学
热膨胀
溶解
电阻率和电导率
压痕硬度
矿物学
折射率
复合材料
化学工程
微观结构
化学
陶瓷
立方氧化锆
工程类
电气工程
光电子学
作者
Mark J. Hyatt,Delbert E. Day
标识
DOI:10.1111/j.1151-2916.1987.tb04901.x
摘要
The glass formation region in the yttria‐alumina‐silica system was investigated. Properties of glasses containing 25 to 55 wt% yttria were measured and the effect of the composition was determined. The density, refractive index, thermal‐expansion coefficient, and microhardness increased with increasing yttria content. The dissolution rate in IN HCl increased with increasing yttria content and temperature. These glasses were also found to have high electrical resistivity.
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