摘要
Advanced MaterialsVolume 18, Issue 8 p. 1023-1027 Communication High-κ Dielectric Nanofilms Fabricated from Titania Nanosheets M. Osada, M. Osada [email protected] Advanced Materials Laboratory, National Institute for Materials Science, 1-1, Namiki, Tsukuba, Ibaraki 305-0044, JapanSearch for more papers by this authorY. Ebina, Y. Ebina Advanced Materials Laboratory, National Institute for Materials Science, 1-1, Namiki, Tsukuba, Ibaraki 305-0044, JapanSearch for more papers by this authorH. Funakubo, H. Funakubo Department of Innovative and Engineered Materials, Tokyo Institute of Technology, 4259, Nagatsuta, Midori-ku, Yokohama 226-8502, JapanSearch for more papers by this authorS. Yokoyama, S. Yokoyama Department of Innovative and Engineered Materials, Tokyo Institute of Technology, 4259, Nagatsuta, Midori-ku, Yokohama 226-8502, JapanSearch for more papers by this authorT. Kiguchi, T. Kiguchi Center for Advanced Materials Analysis, Tokyo Institute of Technology, 2-12-1, O-okayama, Meguro-ku, Tokyo 152-8550, JapanSearch for more papers by this authorK. Takada, K. Takada Advanced Materials Laboratory, National Institute for Materials Science, 1-1, Namiki, Tsukuba, Ibaraki 305-0044, JapanSearch for more papers by this authorT. Sasaki, T. Sasaki Advanced Materials Laboratory, National Institute for Materials Science, 1-1, Namiki, Tsukuba, Ibaraki 305-0044, Japan CREST, Japan Science and Technology Agency, 4-1-8, Honcho, Kawaguchi-shi, Saitama 332-0012, JapanSearch for more papers by this author M. Osada, M. Osada [email protected] Advanced Materials Laboratory, National Institute for Materials Science, 1-1, Namiki, Tsukuba, Ibaraki 305-0044, JapanSearch for more papers by this authorY. Ebina, Y. Ebina Advanced Materials Laboratory, National Institute for Materials Science, 1-1, Namiki, Tsukuba, Ibaraki 305-0044, JapanSearch for more papers by this authorH. Funakubo, H. Funakubo Department of Innovative and Engineered Materials, Tokyo Institute of Technology, 4259, Nagatsuta, Midori-ku, Yokohama 226-8502, JapanSearch for more papers by this authorS. Yokoyama, S. Yokoyama Department of Innovative and Engineered Materials, Tokyo Institute of Technology, 4259, Nagatsuta, Midori-ku, Yokohama 226-8502, JapanSearch for more papers by this authorT. Kiguchi, T. Kiguchi Center for Advanced Materials Analysis, Tokyo Institute of Technology, 2-12-1, O-okayama, Meguro-ku, Tokyo 152-8550, JapanSearch for more papers by this authorK. Takada, K. Takada Advanced Materials Laboratory, National Institute for Materials Science, 1-1, Namiki, Tsukuba, Ibaraki 305-0044, JapanSearch for more papers by this authorT. Sasaki, T. Sasaki Advanced Materials Laboratory, National Institute for Materials Science, 1-1, Namiki, Tsukuba, Ibaraki 305-0044, Japan CREST, Japan Science and Technology Agency, 4-1-8, Honcho, Kawaguchi-shi, Saitama 332-0012, JapanSearch for more papers by this author First published: 07 April 2006 https://doi.org/10.1002/adma.200501224Citations: 202AboutPDF ToolsRequest permissionExport citationAdd to favoritesTrack citation ShareShare Give accessShare full text accessShare full-text accessPlease review our Terms and Conditions of Use and check box below to share full-text version of article.I have read and accept the Wiley Online Library Terms and Conditions of UseShareable LinkUse the link below to share a full-text version of this article with your friends and colleagues. Learn more.Copy URL Share a linkShare onEmailFacebookTwitterLinkedInRedditWechat Graphical Abstract 2D titania nanosheets are attractive candidates as insulating materials for high-κ dielectrics. Solution-based layer-by-layer deposition combined with an atomically flat SrRuO3 electrode produces atomically uniform multilayer nanofilms. These nanofilms exhibit high relative dielectric constants (ϵr) of approximately 125, even for thicknesses down to 10 nm, in contrast to size- induced degradation typical in high-κ materials (see figure). REFERENCES 1 G. E. Moore, Electronics 1965, 38, 114. Google Scholar 2a A. I. Kingon, J.-P. Maria, S. K. Streiffer, Nature 2000, 406, 1032. 10.1038/35023243 CASPubMedWeb of Science®Google Scholar 2b G. D. Wilk, R. M. Wallace, J. M. Anthony, J. Appl. Phys. 2001, 89, 5243. 10.1063/1.1361065 CASWeb of Science®Google Scholar 3 M. Depas, R. L. Van Meirhaegue, W. H. Laflère, F. Cardon, Solid-State Electron. 1994, 37, 433. 10.1016/0038-1101(94)90009-4 CASWeb of Science®Google Scholar 4a T. Sasaki, M. Watanabe, H. Hashizume, H. Yamada, H. Nakazawa, J. Am. Chem. Soc. 1996, 118, 8329. 10.1021/ja960073b CASWeb of Science®Google Scholar 4b T. Sasaki, M. 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