辐照
浅沟隔离
二极管
材料科学
辐射损伤
降级(电信)
辐射
光电子学
电子束处理
沟槽
光学
纳米技术
物理
核物理学
电气工程
工程类
图层(电子)
作者
Hidenori Ohyama,K. Hayama,Kenichiro Takakura,T. Miura,K. Shigaki,T. Jono,Eddy Simoen,Amporn Poyai,C. Claeys
标识
DOI:10.1016/s0167-9317(02)00937-1
摘要
Results are presented of a detailed study of the effects of a high-temperature 2-MeV electron irradiation on the performance degradation of STI (shallow trench isolation) diodes. Reverse current increases after irradiation. After 20 °C irradiation, two majority hole capture levels with (Ev + 0.18 eV) and (Ev + 0.34 eV) were induced. The degradation of the device performance and the introduction rate of the lattice defects decrease with increasing irradiation temperature. This result suggests that the creation and recovery of the radiation damage proceeds simultaneously at high temperature.
科研通智能强力驱动
Strongly Powered by AbleSci AI