螺旋
波形
等离子体
离子
基质(水族馆)
电压
等离子体处理
电极
材料科学
能量(信号处理)
原子物理学
化学
分析化学(期刊)
物理
电气工程
色谱法
工程类
海洋学
有机化学
物理化学
量子力学
地质学
摘要
Control of ion energy distribution functions (IEDF) at the substrate during plasma processing is achieved using a specially tailored voltage waveform for substrate bias, consisting of a short voltage spike in combination with a slow ramp. A much narrower IEDF is possible compared to the conventional approach of applying a sinusoidal waveform to the substrate electrode. Measurements in a helicon plasma combined with a time-dependent spherical-shell plasma fluid model demonstrate the benefits of this method in producing a narrow IEDF of precisely controllable energy, independent of ion mass.
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