材料科学
欧姆接触
肖特基势垒
工作职能
接受者
金属
结晶学
凝聚态物理
冶金
光电子学
纳米技术
化学
二极管
物理
图层(电子)
作者
Masataka Satoh,Hideo Matsuo
出处
期刊:Materials Science Forum
日期:2006-10-01
卷期号:527-529: 923-926
被引量:7
标识
DOI:10.4028/www.scientific.net/msf.527-529.923
摘要
The Schottky barrier height (SBH) of Al, Ti, Au, and Ni contacts to n- and p-type 3C-SiC is investigated by means of I-V and C-V measurements. All metal contacts to n- (net donor concentration: 1.0 x 1016 /cm3) and p-type (net acceptor concentration: 4 x 1016 /cm3) 3C-SiC show the rectifying I-V characteristics except for Al contact to n-type 3C-SiC. Only Al contact to n-type 3C-SiC shows the ohmic characteristics. As the work function of metal is increased from 4.3 (Ti) to 5.2 (Ni) eV, SBH for n-type 3C-SiC is increased from 0.4 to 0.7 eV and SBH for p-type 3C-SiC is decreased from 2.2 to 1.8 eV. The small change of SBH for 3C-SiC may be correlated to the crystal orientation and the defects on the surface of 3C-SiC.
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