贵金属
催化作用
二氧化碳重整
镍
材料科学
甲烷
纳米颗粒
化学工程
纳米技术
金属
冶金
化学
合成气
有机化学
工程类
作者
Wei Kong,Yu Fu,Lei Shi,Shenggang Li,Evgeny I. Vovk,X. H. Zhou,Rui Si,Bingrong Pan,Changkun Yuan,Shuqing Li,Fufeng Cai,He Zhu,Jun Zhang,Yuhan Sun
标识
DOI:10.1016/j.apcatb.2020.119837
摘要
Abstract In Ni-catalyzed methane dry reforming (DRM), CH4 tends to dissociate directly to form carbon on Ni nanoparticles. The lack of oxygen availability on the Ni surface easily lead to carbon deposition. Here the precise decoration of Ni surface by SiO2 can destroy large Ni ensembles, and meanwhile form metastable Ni − O···Si centers. CH4 activates on the small fraction of Ni to form CHx rather than carbon, the same as that on Rh/SiO2. Moreover, the Ni − O···Si center stabilized by interfacial confinement provide labile oxygen to oxidize CHx. This Ni catalyst exhibits highly stable activity under 650 °C, CH4:CO2 = 2:1 and 5 bars without carbon deposition for 100 h, where carbon formation is thermodynamically much favorable. This study shows inert SiO2 can significantly alter the electronic properties of Ni particles via interfacial confinement, mimicking noble metal catalyst during DRM process.
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