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High Performance Semiconducting Nanosheets via a Scalable Powder-Based Electrochemical Exfoliation Technique

材料科学 剥脱关节 纳米片 纳米技术 单层 异质结 光致发光 扫描电子显微镜 化学工程 光电子学 石墨烯 复合材料 工程类
作者
Rebekah A. Wells,Jing Zhang,Tzu‐Heng Chen,Victor Boureau,Marina Caretti,Yongpeng Liu,Jun‐Ho Yum,Hannah Johnson,Sachin Kinge,Aleksandra Rađenović,Kevin Sivula
出处
期刊:ACS Nano [American Chemical Society]
卷期号:16 (4): 5719-5730 被引量:32
标识
DOI:10.1021/acsnano.1c10739
摘要

The liquid-phase exfoliation of semiconducting transition metal dichalcogenide (TMD) powders into 2D nanosheets represents a promising route toward the scalable production of ultrathin high-performance optoelectronic devices. However, the harsh conditions required negatively affect the semiconducting properties, leading to poor device performance. Herein we demonstrate a gentle exfoliation method employing standard bulk MoS2 powder (pressed into pellets) together with the electrochemical intercalation of a quaternary alkyl ammonium. The resulting nanosheets are produced in high yield (32%) and consist primarily of mono-, bi-, triatomic layers with large lateral dimensions (>1 μm), while retaining the semiconducting polymorph. Exceptional optoelectronic performance of nanosheet thin-films is observed, such as enhanced photoluminescence, charge carrier mobility (up to 0.2 cm2 V-1 s-1 in a multisheet device), and photon-to-current efficiency while maintaining high transparency (>80%). Specifically, as a photoanode for iodide oxidation, an internal quantum efficiency up to 90% (at +0.3 V vs Pt) is achieved (compared to only 12% for MoS2 nanosheets produced via ultrasonication). Further using a combination of fluorescence microscopy and high-resolution scanning transmission electron microscopy (STEM), we show that our gently exfoliated nanosheets possess a defect density (2.33 × 1013 cm-2) comparable to monolayer MoS2 prepared by vacuum-based techniques and at least three times less than ultrasonicated MoS2 nanoflakes. Finally, we expand this method toward other TMDs (WS2, WSe2) to demonstrate its versatility toward high-performance and fully scalable van der Waals heterojunction devices.

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