In Situ Growth of Wafer‐Scale Patterned Graphene and Fabrication of Optoelectronic Artificial Synaptic Device Array Based on Graphene/n‐AlGaN Heterojunction for Visual Learning

Abstract The unique optical and electrical properties of graphene‐based heterojunctions make them significant for artificial synaptic devices, promoting the advancement of biomimetic vision systems. However, mass production and integration of device arrays are necessary for visual imaging, which is still challenging due to the difficulty in direct growth of wafer‐scale graphene patterns. Here, a novel strategy is proposed using photosensitive polymer as a solid carbon source for in situ growth of patterned graphene on diverse substrates. The growth mechanism during high‐temperature annealing is elucidated, leading to wafer‐scale graphene patterns with exceptional uniformity, ideal crystalline quality, and precise control over layer number by eliminating the release of volatile from oxygen‐containing resin. The growth strategy enables the fabrication of two‐inch optoelectronic artificial synaptic device array based on graphene/n‐AlGaN heterojunction, which emulates key functionalities of biological synapses, including short‐term plasticity, long‐term plasticity, and spike‐rate‐dependent plasticity. Moreover, the mimicry of visual learning in the human brain is attributed to the regulation of excitatory and inhibitory post‐synapse currents, following a learning rule that prioritizes initial recognition before memory formation. The duration of long‐term memory reaches 10 min. The in situ growth strategy for patterned graphene represents the novelty for fabricating fundamental hardware of an artificial neuromorphic system.