材料科学
等轴晶
极限抗拉强度
微观结构
维氏硬度试验
铜
复合材料
进程窗口
阴极射线
电导率
扫描电子显微镜
电阻率和电导率
冶金
电子
光电子学
工程类
物理
物理化学
电气工程
化学
平版印刷术
量子力学
作者
Ralf Guschlbauer,Soroush Momeni,Fuad Osmanlic,Carolin Körner
标识
DOI:10.1016/j.matchar.2018.04.009
摘要
Additive manufacturing by selective electron beam melting (SEBM) was used to fabricate pure copper specimens. A process window at process temperature of 530 °C, gives the required beam powers and deflection speeds for manufacturing dense specimens (>99.5%). The microstructure of SEBM specimens was analyzed by using optical and scanning electron microscopy (SEM). Electrical conductivity, thermal conductivity, hardness, and mechanical performance were investigated by using eddy current, laser flash analysis, Vickers hardness and tensile tests, respectively. It was found that the variation of beam power and scan speed results in different microstructures from columnar to nearly equiaxed grain. The electrical conductivity of SEBM-processed specimens was above 58 MS/m (>100 IACS) while their hardness was around 55 HV0.05 and 46 HV5 without any dependency on processing parameters within the process window. The tensile tests revealed how vertical cracks affect the mechanical strength under tensile loading condition. The results of this study not only show a reliable process window but also introduce the links between processing parameters, defect formations, conductivity and mechanical strength of pure copper specimens manufactured by SEBM.
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