德拉姆
电容器
材料科学
电压
动态随机存取存储器
光电子学
随机存取存储器
切换时间
低压
磁滞
非易失性存储器
静态随机存取存储器
电气工程
电子工程
计算机科学
计算机硬件
物理
半导体存储器
工程类
量子力学
作者
Minchul Sung,Kwangmyoung Rho,Ja-Yong Kim,Jun-Ho Cheon,Ki‐Young Choi,Dohee Kim,Hoseok Em,Gyeongcheol Park,Jungwook Woo,Yeongyu Lee,Jae‐Hyeon Ko,Moonhoi Kim,Gwangyeob Lee,Seung Wook Ryu,Dong Sun Sheen,Yangsung Joo,Seiyon Kim,Chang Hyun Cho,Myung-Hee Na,Jinkook Kim
标识
DOI:10.1109/iedm19574.2021.9720545
摘要
World-first 1Xnm half-pitch FE-RAM with 8Gb density was fabricated, and operation was confirmed. The conventional FE-RAM maximizes 2Pr by adjusting the capacitor plate voltage according to the data. In this study, despite using a fixed capacitor plate voltage, we showed that memory operation is possible even at a low voltage of ±0.6V by using the pinched hysteresis of 5nm-thick ultra-thin HZO. We measured the switching speed by changing the write time from 5ns to 80ns. 70% of the total polarization can be switched within 20ns tWR (like the DRAM), and the remaining 30% responds to a wide range of write time between 20 and 80ns. For improving the switching speed, it is necessary to reduce bulk defects or design schemes such as Vcore overdrive.
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