拉伤
半导体
材料科学
黑磷
图层(电子)
密度泛函理论
极限抗拉强度
拉伸应变
凝聚态物理
带隙
抗压强度
过渡金属
复合材料
化学
光电子学
计算化学
物理
医学
生物化学
内科学
催化作用
作者
Weiwei Ju,Tongwei Li,Hui Wang,Yongliang Yong,Jinfeng Sun
标识
DOI:10.1016/j.cplett.2015.01.038
摘要
Electronic structures of few-layer black phosphorus (BP) with biaxial strain are investigated by using methods based on density functional theory. The compressive strain can result in a semiconductor–metal transition (SMT) for few-layer BP, whereas the tensile strain only affects the band gaps. The critical compressive strain for the SMT is larger in the thinner 2D BP. The band structures and charge densities are calculated in order to provide imperative understanding on SMT. With the compressive strain, the energy of conduction bands moves down, which is induced by the structural change and is essential reason of SMT.
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