Growth of High Quality Diamond Films on Cu Metal Substrates by MPCVD

High quality polycrystalline diamond films were deposited on Cu metal substrates by microwave plasma chemical vapor deposition (MPCVD) system. The samples obtained under different CH_4 concentration were characterized by high resolution scanning electron microscopy, Raman scattering spectroscopy and X-ray diffraction.The results show that the quality of diamond film prepared by the method is high.