MOSFET
材料科学
平面的
碳化硅
功勋
拓扑(电路)
光电子学
功率MOSFET
电气工程
逻辑门
网络拓扑
电子工程
工程类
晶体管
计算机科学
电压
复合材料
计算机图形学(图像)
操作系统
作者
Aditi Agarwal,Kijeong Han,B. Jayant Baliga
标识
DOI:10.1109/led.2019.2908078
摘要
This letter compares the measured electrical characteristics of 600 V planar-gate inversion-channel 4H-SiC power MOSFETs fabricated with four different cell topologies (Linear, Square, Hexagonal, and Octagonal) for the first time. The High-Frequency Figures-of-Merit (HF-FOMs) of these devices were compared with the commercially available SiC device and the Si CoolMOS product. It was found that the HF-FOMs of the 600-V SiC product and our fabricated conventional Linear cell device are much worse in comparison to the Si CoolMOS product. However, the 600 V SiC power MOSFET with comparable performance to the Si CoolMOS product could be achieved by using the Octagonal cell topology.
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