LDMOS
击穿电压
电气工程
材料科学
功率MOSFET
电压
降级(电信)
光电子学
高压
图层(电子)
MOSFET
工程类
晶体管
复合材料
作者
K. Kinoshita,Yusuke Kawaguchi,Akio Nakagawa
标识
DOI:10.1109/ispsd.1998.702630
摘要
This paper presents a new adaptive resurf (reduced surface field) concept for 20 V LDMOS which introduces an additional resurf layer to the conventional resurf layer. The new resurf LDMOS achieves a sufficiently low on-resistance of 17.7 m/spl Omega//spl middot/mm/sup 2/ and a high static breakdown voltage of 28.0 V without significant breakdown voltage degradation under large drain current flow conditions. The device on-state breakdown voltage for a 5 V gate voltage is 21.8 V.
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