Observation of nonvolatile resistive switching behaviors in 2D layered InSe nanosheets through controllable oxidation

Scientists have been seeking for suitable materials with nonvolatile resistive switching (RS) performance for memristive applications. Recently, nonvolatile RS behaviors have been achieved in an increasing number of two-dimensional (2D) materials. However, 2D InSe layers have not been reported to demonstrate such nonvolatile RS behaviors. Herein, we experimentally observe nonvolatile bipolar RS behaviors in 2D InSe nanosheets through controllable oxidation. In our experiments, the exfoliated InSe nanosheets annealed at the temperature of 350 °C for 2 h show typical nonvolatile bipolar RS performance with a low SET voltage of ∼0.3 V and a high ON/OFF ratio of 4.5 × 103 at the read voltage of 0.1 V. Raman and x-ray photoelectron spectroscopy characterizations confirm the partial oxidation in InSe nanosheets after annealing. The observed nonvolatile RS behaviors are owing to the formation of In2O3 and the increased insulating characteristic in the annealed InSe nanosheets. Furthermore, the fabricated memristor exhibits good retention property and endurance performance. Such annealed InSe nanosheets not only demonstrate decent RS performance but also enrich the family of 2D materials to fabricate memristors for applications in next-generation nonvolatile memory.