领域(数学分析)
磁畴壁(磁性)
凝聚态物理
物理
剪切(物理)
从头算
中心(范畴论)
垂直的
材料科学
结晶学
几何学
热力学
量子力学
数学分析
化学
数学
磁化
磁场
作者
Takahiro Shimada,Yoshitaka Umeno,Takayuki Kitamura
标识
DOI:10.1103/physrevb.77.094105
摘要
We investigated the atomistic and electronic structure of the 90\ifmmode^\circ\else\textdegree\fi{} domain wall in $\mathrm{Pb}\mathrm{Ti}{\mathrm{O}}_{3}$ and the fundamental mechanism of domain switching induced by shear stress using first-principles density functional theory calculations within the local density approximation. Under strain-free condition, the magnitude of polarization at the center of the domain wall decreased by 20% from that of the bulk, and the direction rotated within the transition region of $1.3\phantom{\rule{0.3em}{0ex}}\mathrm{nm}$. Under strain, the applied shear deformation concentrated near the 90\ifmmode^\circ\else\textdegree\fi{} domain wall, and the domain wall began to migrate in a direction perpendicular to itself after the stress reached the critical magnitude of $152\phantom{\rule{0.3em}{0ex}}\mathrm{MPa}$. The migration direction was governed by the shearing direction. During stress-induced domain switching, a Pb-O covalent bond at the center of the domain wall broke, and concurrently, another bond on the neighboring Pb-O site was formed with a large movement of the Pb atom. Thus, reconstruction of the Pb-O bond was associated with the domain switching.
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