Computational analysis of the orientation persistence length of the polymer chain orientation

Analyzing and interpreting the nanoscale morphology of semiconducting polymers is one of the key challenges for advancing in organic electronics. The orientation persistence length (OPL) as a tool to analyze orientation maps generated by photoemission electron microscopy (PEEM) - a state of the art tool for nanoscale imaging/spectroscopy - is presented here. The OPL is a way to quantify the chain orientation within the polymer film in a single graph. In this regard, it is a convincing method that will enable additional direct correlations between the chain orientation and electrical or optical parameters. In this report, we provide computational insights into the factors that contribute to the OPL.