空位缺陷
材料科学
镓
晶体缺陷
接受者
电子结构
氮化镓
半导体
氮气
结晶学
凝聚态物理
原子物理学
光电子学
纳米技术
化学
物理
有机化学
图层(电子)
冶金
作者
Jörg Neugebauer,Chris G. Van de Walle
出处
期刊:Physical review
日期:1994-09-15
卷期号:50 (11): 8067-8070
被引量:771
标识
DOI:10.1103/physrevb.50.8067
摘要
We have studied the electronic structure, atomic geometry, and formation energies of native defects in GaN using first-principles total-energy calculations. Our results reveal the vacancies to be the dominant defects in GaN, whereas antisites and interstitials are energetically less favorable. In p-type GaN the nitrogen vacancy (a donor) has the lowest formation energy, in n-type GaN the gallium vacancy (an acceptor). Our results show that the vacancies may be important for compensation. However, isolated point defects and particularly the nitrogen vacancy can be excluded as the source for the n-type conductivity in as-grown GaN, contrary to the generally accepted picture.
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