雪崩二极管
雪崩击穿
击穿电压
材料科学
二极管
光电子学
齐纳二极管
降级(电信)
静电放电
撞击电离
随时间变化的栅氧化层击穿
单光子雪崩二极管
硅
电压
俘获
电气工程
栅氧化层
工程类
晶体管
雪崩光电二极管
化学
电离
离子
生态学
有机化学
探测器
生物
作者
Hossein Sarbishaei,Vladislav Vashchenko,Andrei Shibkov
标识
DOI:10.23919/eos/esd54763.2022.9928458
摘要
50 Words Abstract – Degradation of ESD avalanche diodes breakdown voltage in BCD process technology as a result of short term (minutes to hours) electrical overstress in avalanche breakdown regime is studied. It is shown, that the magnitude of the breakdown voltage walk-in or walk-out can be adequately predicted by numerical simulation with setup similar Hot Carrier Degradation for charge trapping effect at silicon-oxide interface and is a function of the device structure parameters.
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