掺杂剂
碲化镉光电
化学
群(周期表)
单晶
兴奋剂
结晶学
纳米技术
凝聚态物理
材料科学
物理
有机化学
作者
Akira Nagaoka,Koji Kimura,Artoni Kevin R. Ang,Yasuhiro Takabayashi,Kenji Yoshino,Qingde Sun,Baoying Dou,Su‐Huai Wei,Kôichi Hayashi,Kensuke Nishioka
摘要
Point defect chemistry strongly affects the fundamental properties of materials and has a decisive impact on device performance. The Group-V dopant is prominent acceptor species with high hole concentration in CdTe; however, its local atomic structure is still not clear owing to difficulties in definitive measurements and discrepancies between experimental observations and theoretical models. Herein, we report on direct observation of the local structure for the As dopant in CdTe single crystals by the X-ray fluorescence holography (XFH) technique, which is a powerful tool to visualize three-dimensional atomic configurations around a specific element. The XFH result shows the As substituting on both Cd (AsCd) and Te (AsTe) sites. Although AsTe has been well known as a shallow acceptor, AsCd has not attracted much attention and been discussed so far. Our results provide new insights into point defects by expanding the experimental XFH study in combination with theoretical first-principles studies in II-VI semiconductors.
科研通智能强力驱动
Strongly Powered by AbleSci AI