激进的
紫外线
降级(电信)
化学
光化学
抗生素
材料科学
有机化学
光电子学
计算机科学
生物化学
电信
作者
Tiehong Song,Guanqiao Li,Ruihua Hu,Ying Liu,Hongxu Liu,Yanjiao Gao
出处
期刊:Catalysts
[MDPI AG]
日期:2022-09-09
卷期号:12 (9): 1025-1025
被引量:25
标识
DOI:10.3390/catal12091025
摘要
The ultraviolet (UV)/H2O2, UV/O3, UV/peroxodisulfate (PDS) and UV/peroxymonosulfate (PMS) methods are called UV-based advanced oxidation processes. In the UV/H2O2 and UV/O3 processes, the free radicals generated are hydroxyl radicals (•OH), while in the UV/PDS and UV/PMS processes, sulfate radicals (SO4•−) predominate, accompanied by •OH. SO4•− are considered to be more advantageous than •OH in degrading organic substances, so the researches on activation of PDS and PMS have become a hot spot in recent years. Especially the utilization of UV-activated PDS and PMS in removing antibiotics in water has received much attention. Some influencing factors and mechanisms are constantly investigated and discussed in the UV/PDS and UV/PMS systems toward antibiotics degradation. However, a systematic review about UV/PDS and UV/PMS in eliminating antibiotics is lacking up to now. Therefore, this review is intended to present the properties of UV sources, antibiotics, and PDS (PMS), to discuss the application of UV/PDS (PMS) in degrading antibiotics from the aspects of effect, influencing factors and mechanism, and to analyze and propose future research directions.
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