JFET公司
材料科学
绝缘栅双极晶体管
光电子学
逆变器
肖特基二极管
MOSFET
电气工程
肖特基势垒
二极管
兴奋剂
晶体管
功率半导体器件
场效应晶体管
碳化硅
电压
工程类
复合材料
作者
Kenji Hamada,Shiro Hino,Naruhisa Miura,Hiroshi Watanabe,Shuhei Nakata,E. Suekawa,Yuji Ebiike,Masayuki Imaizumi,Isao Umezaki,Satoshi Yamakawa
标识
DOI:10.7567/jjap.54.04dp07
摘要
We have successfully developed 4H-SiC devices including metal–oxide–semiconductor field-effect transistors (MOSFETs) and Schottky barrier diodes (SBDs) with a rated voltage of 3.3 kV. The conduction loss of the SiC-MOSFET was reduced to as low as that of the Si-insulated gate bipolar transistor (IGBT) by the n-type doping of the junction field-effect transistor region (JFET doping). The JFET doping technique is effective in reducing the temperature coefficient of resistance in the JFET region, leading to the decreased on-resistance of the SiC-MOSFET at high temperatures. These devices have been applied to 3.3 kV/1500 A modules for the world's first all-SiC traction inverter. The switching loss of the new traction inverter system is approximately 55% less than that of a conventional inverter system incorporating Si modules.
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