硼
氮化硼
溅射
体积流量
沉积(地质)
氮气
材料科学
X射线光电子能谱
分析化学(期刊)
溅射沉积
氮化物
涂层
化学
化学工程
薄膜
纳米技术
环境化学
图层(电子)
热力学
古生物学
物理
有机化学
沉积物
生物
工程类
作者
Mingfeng Li,Xiaolei Wen,Huan Hu,Pengyuan Wu,Oleksiy V. Penkov
出处
期刊:Vacuum
[Elsevier]
日期:2024-01-01
卷期号:219: 112741-112741
标识
DOI:10.1016/j.vacuum.2023.112741
摘要
Monolayer boron and B/Mo/B/Mo coatings were prepared by reactive magnetron sputtering in the N2/Ar atmosphere with different RF powers, and the effect of the N2:Ar flow ratio was studied. It was found that as the N2:Ar flow ratio increased, the deposition rate of boron coatings exhibited three different stages of variation due to different mechanisms. The variation of deposition rate with increasing N2:Ar flow ratio was consistent for different RF powers. Berg's model explained experimental findings. XPS revealed that the coatings contained more than 86 % boron nitride (BN) when the N2 flow ratio was above 0.053 at 300W RF power. An optimal ratio exists that maximizes the boron deposition rate and produces a nearly pure boron nitride coating without target poisoning.
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