阈下斜率
理想(伦理)
材料科学
阈下传导
晶体管
场效应晶体管
凝聚态物理
光电子学
纳米技术
物理
电压
量子力学
哲学
认识论
作者
Jiayang Hu,Hanxi Li,Anzhe Chen,Yishu Zhang,Hailiang Wang,Yu Fu,Xin Zhou,Kian Ping Loh,Yu Kang,Jian Chai,Chen‐Hao Wang,Jiachao Zhou,Jialei Miao,Yuda Zhao,Shuai Zhong,Rong Zhao,Kaihui Liu,Yang Xu,Bin Yu
出处
期刊:ACS Nano
[American Chemical Society]
日期:2024-07-29
卷期号:18 (31): 20236-20246
标识
DOI:10.1021/acsnano.4c03856
摘要
The Boltzmann Tyranny, set by thermionic statistics, dictates the lower limit of switching slope (SS) of a MOSFET to be 60 mV/dec, the fundamental barrier for low-dissipative electronics. The large SS leads to nonscalable voltage, significant leakage, and power consumption, particularly at short channels, making transistor scaling an intimidating challenge. In recent decades, an array of steep-slope transistors has been proposed; none is close to an ideal switch with ultimately abrupt switching (SS ∼ 0 mV/dec) between the binary logic states. We demonstrated an all-2D-materials van-der-Waals-heterostructure (vdW)-based FET that exhibits ultrasteep switching (0.33 mV/dec), a large on/off current ratio (∼107), and an ultralow off current (∼0.1 pA). The "Subthreshold-Free" operation achieved by the collective behavior of functional materials enables FET switching directly from the OFF-state to the ON-state with entirely eliminated subthreshold region, behaving as the ideal logic switch. Two-inch wafer-scale device fabrication is demonstrated. Boosted by device innovation and emerging materials, the research presents an advancement in achieving the "beyond-Boltzmann" transistors, overcoming one of the CMOS electronics' most infamous technology barriers that have plagued the research community for decades.
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