极紫外光刻
宽带
等离子体
激光器
铜
计量学
极端紫外线
光源
光学
材料科学
光电子学
物理
冶金
量子力学
作者
Seth L. Cousin,Feng Dong,Matt Hettermann,Dave Houser,Patrick Naulleau
标识
DOI:10.1364/euvxray.2024.etu6a.2
摘要
The performance and characteristics of our broadband EUV source derived from copper-based laser produced plasma, currently in use in our EUV reflectometer and EUV Scatterometry tools are presented for the first time in this submission
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