The influence of deposition conditions on the surface morphology and luminescent properties of (Y 0.06 Ga 0.94 ) 2 O 3 :Cr thin films

Thin films of (Y0.06Ga0.94)2O3:Cr were obtained by radio-frequency (RF) ion-plasma sputtering in an argon atmosphere on polycrystalline polycor and amorphous υ-SiO2 substrates. The surface morphology of the films was studied by atomic force microscopy. It was found that during argon annealing of (Y0.06Ga0.94)2O3:Cr thin films on υ-SiO2 substrates, grain growth occurs perpendicular to the substrate surface. The results of studies of the photoluminescence and cathodoluminescence luminescence of the investigated films are presented. It is shown that thin films of (Y0.06Ga0.94)2O3:Cr on υ-SiO2 substrates under photoexcitation emit in the blue region of the spectrum and this luminescence is due to the luminescence of the (Y0.06Ga0.94)2O3 matrix. Under cathodic excitation, the activator luminescence of the Cr3+ ion dominates with a maximum in the region around 700 nm, due to the electronic transitions 4T2 → 4A2.