薄膜晶体管
材料科学
非晶半导体
半导体
无定形固体
氧化物
晶体管
电子结构
电子迁移率
薄膜
纳米技术
光电子学
工程物理
凝聚态物理
结晶学
冶金
化学
电气工程
物理
工程类
图层(电子)
电压
作者
John Robertson,Zhaofu Zhang
标识
DOI:10.1002/9781119715641.ch3
摘要
This chapter describes the electronic structure of amorphous oxide semiconductors (AOSs). It explains why their electron mobility is so high, why they differ from amorphous Si in having a field-effect mobility that is not heavily degraded by localized tail states, what the critical defects in these oxides are and how to use third elements like Ga to control them, which defects cause the instabilities of thin-film transistors, and why there are presently no good p -type AOSs.
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