Physical vapor deposition (PVD) processes

Each of the PVD processes discussed has its advantages and disadvantages. Each requires different process monitoring and controlling techniques. Generally, the most simple technique and configuration that will give the desired film properties and most economical product throughput should be used. There are no “handbook values” for the properties of deposited thin films and the properties depend on the details of the deposition process. In order to have a reproducible process and product it is important to have good process controls.