电镀
阳极
铬
材料科学
钻石
无机化学
电极
硼
合金
电解
六价铬
化学气相沉积
冶金
化学
电解质
图层(电子)
纳米技术
有机化学
物理化学
作者
Daiyu Kodama,Ayato Tamura,Takahiro Hattori,Masatoshi Sakurai,Takehiko Kamiya,Yoichiro Maeda,M. Shimomura
标识
DOI:10.1016/j.diamond.2021.108588
摘要
Boron-doped diamond (BDD) films (boron content: 17,000 ppm) were grown by hot-filament chemical vapor deposition. To investigate whether BDD films are suitable anode materials in the chromium electroplating process, the oxidation behavior from Cr3+ to Cr6+ was investigated on a BDD electrode. The current efficiency of the BDD electrode for Cr3+ oxidation was similar to that of lead alloy anode, the conventional anode in chromium electroplating processes. In strong acid solution (pH = −0.39), Cr3+ ions were readily oxidized on the BDD and lead alloy electrodes but were not oxidized on platinum and iridium oxide electrodes. Furthermore, during electrolysis for 50 h using the BDD anode in a hexavalent chromium electroplating bath, the Cr3+ ion concentration was maintained below 1.5 g/L. According to these results, the BDD anode is a feasible alternative to lead alloy in hexavalent chromium electroplating.
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