退火(玻璃)
钝化
硅
硼
材料科学
兴奋剂
非晶硅
无定形固体
多晶硅
分析化学(期刊)
纳米技术
晶体硅
光电子学
化学
有机化学
图层(电子)
冶金
薄膜晶体管
作者
Vaibhav V. Kuruganti,Alexander Mazurov,Sven Seren,Olindo Isabella,Valentin D. Mihailetchi
出处
期刊:IEEE Journal of Photovoltaics
日期:2024-01-01
卷期号:14 (1): 74-79
标识
DOI:10.1109/jphotov.2023.3323788
摘要
In this work, we developed an in situ annealing process to crystallize boron-doped amorphous silicon [a-Si(p + )] layers deposited by atmospheric pressure chemical vapour deposition (APCVD) to form boron-doped polycrystalline silicon [poly-Si(p + )] layers. The influence of the temperature profiles during a-Si(p + ) inline deposition on structural, electrical, and passivation properties was studied in detail. The results show that a-Si(p + ) layers can be successfully crystallized by fine-tuning the temperature profiles in the postdeposition zones of the APCVD tool. It was observed that the hydrogenation processes during the fast firing play a significant role in enhancing the passivation quality as well as the electrical properties of the in situ annealed poly-Si(p + ) layers. The sheet resistance ( Rsh ) and implied open circuit voltage ( iVoc ) of the best in situ annealed poly-Si(p + ) layers were found to be comparable to the ones that were ex situ annealed in the tube furnace at 950 $^{\circ }$ C for 30 min. The sheet resistance of 200 $\Omega$ / $\square$ could be obtained on 150-nm thick poly-Si(p + ) layers with an ( iVoc ) of 718 mV. The use of this novel in situ annealing process to form poly-Si(p + ) layers opens a new horizon for a lean process sequence without the additional high-temperature annealing step for fabricating solar cells concepts based on passivating contact.
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