Perfect Ultraviolet Absorbers via Disordered Polarizonic Metasurfaces for Multiband Camouflage and Stealth Technologies

伪装 材料科学 等离子体子 紫外线 纳米技术 光刻 吸收(声学) 光电子学 计算机科学 光学 物理 人工智能 复合材料
作者
Mhd Adel Assad,Mady Elbahri
出处
期刊:Advanced Functional Materials [Wiley]
标识
DOI:10.1002/adfm.202418271
摘要

Abstract Achieving multiband camouflage through the integration of ultraviolet (UV) absorption, visible light camouflage, and infrared signature modulation has long posed a challenge in material science. Leveraging the polarizonic concept, the study demonstrates, for the first time, the broadband camouflage system that adheres to the golden rule by achieving near‐perfect UV absorption (99.96%) across the UV‐A, UV‐B, and UV‐C ranges. This system is also visibly colored to blend with its environment and leaves no thermal signature in the IR. Traditionally, earth‐abundant metals, such as iron, are not considered viable for plasmonic color applications due to their high optical losses and oxidation susceptibility that degrade their optical properties. However, contrary to conventional assumptions, the study introduces a sustainable color palette derived from transparent and grey earth‐abundant materials, offering novel approaches to color, stealth, and energy‐harvesting metasurface‐driven technologies. The simple, cost‐effective, and environmentally friendly co‐sputtering fabrication method highlights the impact of the polarizonic concept and its novel dipolar image interference phenomena on flexible substrates therefore passivating the way for scalable and sustainable solutions in next‐generation camouflage systems with potential applications in UV‐protective coatings, photolithography, and anti‐counterfeiting technologies.
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