聚酰亚胺
材料科学
热膨胀
复合材料
制作
硅
电子包装
微电子机械系统
基质(水族馆)
光电子学
电子工程
图层(电子)
工程类
医学
海洋学
替代医学
病理
地质学
作者
Yuan-Chiu Huang,Han‐Wen Hu,Y. R. Liu,Hui-Ching Hsieh,Kuan‐Neng Chen
标识
DOI:10.1109/jeds.2024.3358830
摘要
In advanced packaging schemes, such as fan-out integration technology, photosensitive polyimide (PSPI) is the key material to the fabrication of panel level redistribution-layer (RDL). However, a large mismatch of coefficient of thermal expansion (CTE) between silicon (Si) and PSPI will cause serious warpage issue. Furthermore, polyimide deformation may occur under external heat and pressure, leading to deterioration of RDL reliability. In this work, PSPI with low CTE and excellent adhesion strength on different substrate was developed and evaluated by lithography test, adhesion test, and reliability test, showing the high feasibility for the application in advanced packaging process.
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