材料科学
钝化
薄脆饼
共发射极
单晶硅
纳米-
硅
各向同性腐蚀
纳米结构
光电子学
Crystal(编程语言)
蜂巢
蚀刻(微加工)
纳米技术
复合材料
程序设计语言
图层(电子)
计算机科学
作者
Tian Pu,Honglie Shen,Kuang Hong Neoh,Kai Gao,Fei Ye
出处
期刊:Solar Energy
[Elsevier]
日期:2021-08-01
卷期号:224: 916-922
被引量:2
标识
DOI:10.1016/j.solener.2021.06.066
摘要
In this paper, a light-trapping nano honeycomb (NH) structure with a polyhedral interior was prepared on a c-Si wafer surface, which has a much lower reflectance and better passivation effect than that of a pyramid-textured surface. The NH structure was prepared using the metal-assisted chemical etching method together with the nanostructure rebuilding (NSR) method. Through reflectance measurement, internal quantum efficiency characterization and finite-difference time-domain simulation, the advantages of the NH structure were systematically studied. The formation mechanism of the NH structure was considered to be due to both the anisotropic and isotropic etching properties of Si crystal, and its main affecting factor was the NSR reaction time. To further demonstrate its potential in monocrystalline silicon cells, passivated emitter and rear cells (PERC) using NH-textured c-Si wafers were fabricated. A high efficiency of 22.80% was achieved, which was 0.3% and 0.16% higher compared to the normal upward pyramid-textured PERC and the inverted pyramid-textured PERC, respectively. The NH structure is expected to have a great potential application in the mass production of c-Si solar cells.
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