材料科学
晶体管
CMOS芯片
电子线路
集成电路
与非门
氮化镓
光电子学
逻辑门
电流模式逻辑
通流晶体管逻辑
电气工程
场效应晶体管
电子工程
工程类
数字电子学
纳米技术
电压
图层(电子)
作者
Zheyang Zheng,Li Zhang,Wenlei Song,Sirui Feng,Han Xu,Jiahui Sun,Song Yang,Tao Chen,Jin Wei,Kevin J. Chen
标识
DOI:10.1038/s41928-021-00611-y
摘要
Owing to its energy efficiency, silicon complementary metal–oxide–semiconductor (CMOS) technology is the current driving force of the integrated circuit industry. Silicon’s narrow bandgap has led to the advancement of wide-bandgap semiconductor materials, such as gallium nitride (GaN), being favoured in power electronics, radiofrequency power amplifiers and harsh environment applications. However, the development of GaN CMOS logic circuits has proved challenging because of the lack of a suitable strategy for integrating n-channel and p-channel field-effect transistors on a single substrate. Here we report the monolithic integration of enhancement-mode n-channel and p-channel GaN field-effect transistors and the fabrication of GaN-based complementary logic integrated circuits. We construct a family of elementary logic gates—including NOT, NAND, NOR and transmission gates—and show that the inverters exhibit rail-to-rail operation, suppressed static power dissipation, high thermal stability and large noise margins. We also demonstrate latch cells and ring oscillators comprising cascading logic inverters. Through the monolithic integration of enhancement-mode n-type and p-type gallium nitride field-effect transistors, complementary integrated circuits including latch circuits and ring oscillators can be created for use in high-power and high-frequency applications.
科研通智能强力驱动
Strongly Powered by AbleSci AI