光掩模
极紫外光刻
介绍(产科)
材料科学
节点(物理)
影子(心理学)
计算机科学
持续性
光学
工程物理
工程类
纳米技术
物理
抵抗
结构工程
医学
心理学
生态学
图层(电子)
生物
心理治疗师
放射科
摘要
Since the advent of EUV into high volume manufacturing at the 7 nm node, the role played by EUV materials in the photomask and optics for long term sustainability is considered. This presentation examines current and future choices for materials in the photomask and optics. More flexible high NA design, tolerance to defects, longer lifetimes, 3D shadow mask effect are factors which drive new choices in materials. Given the trade-offs required, new possibilities in materials are proposed which are holistically considered solutions to the challenges presented by next generation manufacturing.
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