异质结双极晶体管
单片微波集成电路
放大器
电气工程
材料科学
光电子学
射频功率放大器
磷化铟
功率增加效率
电容器
分布式放大器
晶体管
双极结晶体管
工程类
砷化镓
CMOS芯片
电压
作者
Nguyen L. K. Nguyen,Duy P. Nguyen,Alexander N. Stameroff,Anh‐Vu Pham
标识
DOI:10.1109/apmc47863.2020.9331518
摘要
A high output power monolithic microwave/millimeter-wave integrated circuit (MMIC) distributed amplifier (DA) is demonstrated in an Indium Phosphide (InP) hetero-junction bipolar transistor (HBT) process. The DA employs nine double-stacked HBT gain unit cells with the proposed parallel/series metal-insulator-metal (MIM) configuration for the input coupling capacitors. The fabricated amplifier achieves a measured average gain of 11.5 dB over a 3 dB bandwidth from 1 to 150 GHz with a noise figure (NF) of 10.3 dB. The maximum measured saturated power (Psat) is 18.3 dBm with the corresponded 1-dB gain compression power (P1dB) of 15.4 dBm at 50 GHz. The power-added-efficiency (PAE) of the amplifier is 10 % at 100 GHz.
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