Growth of Carbon Nanotubes by PECVD and its Applications: A Review

Background: In this part of review, a detailed discussion of plasma enhanced chemical vapour deposition (PECVD) has been done specially for the growth of single wall carbon nanotubes (SWCNTs). Many scientific groups are working on this technique and modifying it day by day. This part of discussion generally reviews the emerging status and high modification of nanotechnology in the field of growth techniques specially for the carbon nanotubes (CNTs) which includes the (1) Reaction chamber (2) Role of plasma in CNT growth (3) Mechanism of CNT growth (4) Applications of CNTs. Keywords: Carbon nanotubes, nanosensor, chemical vapour deposition, VLSI, plasma, plasma enhanced chemical vapour deposition (PECVD).