抛光
旋转对称性
职位(财务)
机械工程
材料科学
有限元法
位置误差
光学
计算机科学
工程制图
工程类
结构工程
几何学
数学
物理
方向(向量空间)
经济
财务
作者
Christophe Bouvier,S. J. Burns,Sheryl M. Gracewski,Edward Fess
摘要
A new generation of compliant tools and processes called UltraForm Finishing is under development at the Center for Optics Manufacturing (COM) and OptiPro Systems (Ontario, NY). The purpose is to achieve rapid, high quality finishing of hard materials. These compliant tools exhibit a large contact patch that can be up to 1 cm wide. A numerical model was developed to account for finite contact patch geometry on removal for a flat rotating axisymmetric workpiece. This model was used to determine the depth of removal as a function of radial position after the polishing tool has completely traversed the workpiece from its center to a given radial position. The depth of removal was investigated for circular and oval contact patches and a variety of removal functions. A constant removal depth is desired to minimize the induced figure error. Predicted results were compared to experimental measurements of induced figure error.
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