材料科学
发光二极管
光电子学
量子效率
二极管
原子层沉积
带材弯曲
宽禁带半导体
X射线光电子能谱
能量转换效率
图层(电子)
纳米技术
核磁共振
物理
作者
Kwang‐Eun Kim,Mengyuan Hua,Dong Liu,Jisoo Kim,Kevin J. Chen,Zhenqiang Ma
出处
期刊:Nano Energy
[Elsevier]
日期:2017-11-25
卷期号:43: 259-269
被引量:37
标识
DOI:10.1016/j.nanoen.2017.11.047
摘要
Improving the energy conversion efficiency of light-emitting diodes (LEDs) for blue light emission has been a continuing pursuit for the past several decades. Here, we report InGaN/GaN LEDs with improved energy efficiency through the simple deposition of multifunctional ultrathin AlN/Al2O3 layers on top of p-type GaN (i.e., GaN:Mg) using remote plasma pretreatment and plasma-enhanced atomic-layer deposition (PEALD). The AlN/Al2O3 stacked layers played principal roles in improving the LED energy efficiency: 1) The surface defect states of p-type GaN were reduced to minimize leakage current and oxidation was prevented by passivating the GaN surface; 2) the net positive charges formed at the AlN/GaN interface enhanced the hole injection rate into the multi-quantum well (MQW) by formation of downward band bending with the increased surface potential; and 3) the increased hole injection rate induced the band-filling effect and screening of internal polarization fields in the MQW. The AlN/Al2O3 stacked layers deposited on the GaN:Mg have overall improved the radiative recombination rate of the InGaN/GaN LEDs and thus light-emission efficiency. X-ray photoelectron spectroscopy was used to characterize the surface potential change of GaN. The peak efficiency values of wall-plug efficiency, the external-quantum efficiency, and the efficacy of the AlN/Al2O3 coated InGaN/GaN LEDs were improved by 29%, 29%, and 30%, respectively. The corresponding efficiency droop rates were decreased by 13%, 6% and 3%, respectively, as compared to those of reference LEDs.
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