光催化
石墨氮化碳
材料科学
可见光谱
扫描电子显微镜
透射电子显微镜
表面光电压
化学工程
光化学
光致发光
催化作用
纳米颗粒
纳米技术
化学
复合材料
光电子学
有机化学
光谱学
工程类
物理
量子力学
作者
Wei Feng,Jiadong Li,Changchang Dong,Yajun Bi,Xiaojun Han
出处
期刊:Chemosphere
[Elsevier]
日期:2020-03-01
卷期号:242: 125201-125201
被引量:70
标识
DOI:10.1016/j.chemosphere.2019.125201
摘要
Photocatalytic disinfection with high performance is thought to be a promising way for water purification. Herein, plasmonic Ag doped urea-derived graphitic carbon nitride (g-C3N4) composites were fabricated via in-situ photo-deposition at room temperature as the visible-light photocatalyst. Scan electron microscopy and transmission electron microscopy images showed the uniform dispersion of Ag nanoparticles on the surface of g-C3N4 sheet, which facilitated the synergistic effect of antibacterial performance from Ag and photocatalytic property from Ag/g-C3N4 composites. Photocatalytic water disinfection against Escherichia coli with visible light was performed to demonstrate the improved photocatalytic property with assistance of Ag. The 3-Ag/g-C3N4 exhibited the best bactericidal performance by inactivating all bacteria within 120 min with damaged cell membranes of Escherichia coli observed by scan electron microscopy and transmission electron microscopy images. Photoluminescence spectra, steady-state surface photovoltage spectra, photocurrent response, and electrochemical impedance spectra results revealed that Ag nanoparticles inhibited the recombination of photo-generated e− and h+ pairs and further reinforced the photocatalytic performance of g-C3N4. Scavenger experiments indicated that h+ produced on valence band of g-C3N4 dominated the photocatalytic disinfection process against Escherichia coli. This work further proved Ag/g-C3N4 showed great potential in photocatalytic water disinfection under visible-light irradiation.
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