功勋
场效应晶体管
物理
领域(数学)
电气工程
分析化学(期刊)
光电子学
晶体管
化学
电压
量子力学
数学
工程类
色谱法
纯数学
作者
Yuanjie Lv,Hongyu Liu,Xingye Zhou,Yuangang Wang,Xubo Song,Yuncong Cai,Qinglong Yan,Chenlu Wang,Shixiong Liang,Jincheng Zhang,Zhihong Feng,Hong Zhou,Shujun Cai,Yue Hao
出处
期刊:IEEE Electron Device Letters
[Institute of Electrical and Electronics Engineers]
日期:2020-02-17
卷期号:41 (4): 537-540
被引量:100
标识
DOI:10.1109/led.2020.2974515
摘要
In this work, we have demonstrated highperformance lateral β-Ga 2 O 3 metal-oxide-semiconductor field-effect transistors (MOSFETs) with state-of-art power figure-of-merit (P-FOM) and breakdown voltage (BV) by adopting a T-shape gate field-plate and source connected field-plate structures. Depletion-mode (D-mode) β-Ga 2 O 3 MOSFETs with gate-to-drain distance (LGD) of 4.8 μm/17.8 μm demonstrate a BV of 1.4 kV/2.9 kV and specific ON-resistance (RON,sp) of 7.08 mΩ·cm2 /46.2 mΩ·cm 2 , respectively, yielding a high P-FOM of 277 MW/cm 2 and averaged electrical field of 2.9 MV/cm for the device with LGD = 4.8 μm. To the best of all the authors' knowledge, this P-FOM of 277 MW/cm 2 and BV = 2.9 kV are the highest values among all the lateral D-mode β-Ga 2 O 3 MOSFETs. Combined with negligible gate pulsed and drain pulsed current collapse and drain current on/off ratio of 109, these β-Ga 2 O 3 MOSFETs show a great potential for future power electronic applications.
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