介电谱
腐蚀
材料科学
缓蚀剂
合金
吸附
极化(电化学)
吲唑
电化学
核化学
循环伏安法
涂层
X射线光电子能谱
无机化学
化学工程
冶金
电极
有机化学
化学
物理化学
复合材料
工程类
作者
Zakia Aribou,Manale Ouakki,Nidal Khemmou,Sarra Sibous,E. Ech–chihbi,Otmane Kharbouch,M. Galai,Abdelaziz Souizi,Saı̈d Boukhris,M. Ebn Touhami,Abeer A. AlObaid,Ismail Warad
标识
DOI:10.1016/j.mtcomm.2023.107061
摘要
This study aims to evaluate the inhibition performance of new indazole-derived compounds, namely 3,3-dimethyl-13- (4-nitrophenyl)- 3,4-dihydro-1H- indazolo [1,2b] phthalazine 1,6,11 (2H,13H) trione (Ind-NO2) and 3,3-dimethyl-13-(p-tolyl)-3,4-dihydro-1H-indazolo[1,2-b]phthalazine-1,6,11 (2H,13H)-trione (Ind-CH3), in preventing the corrosion of brass in a highly corrosive medium containing 1.0 M hydrochloric acid (HCl). The inhibitory performance was evaluated using electrochemical impedance spectroscopy (EIS) and potentiodynamic polarization (PDP) methods. A considerable decrease in the corrosion rate of brass was observed when treated with these compounds compared to the uninhibited solutions. The EIS analysis suggested the formation of a protective coating on the brass surface by the inhibitors, leading to an enhanced barrier to electron transfer and reduced corrosion rate.The formation of this protective coating was further confirmed through SEM-EDX analysis and X-ray photoelectron spectroscopy. The chemical reactions occurring during the corrosion and inhibition processes were identified using ICP-OES and UV–vis spectroscopy. Additionally, DFT calculations of Ind-NO2 and Ind-CH3provided molecular-level insights into the inhibition mechanism. These findings contribute to the development of anti-corrosion materials and indicate the potential application of these compounds in real-world settings.
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