In-situ R DS(on) Characterization and Lifetime Projection of GaN HEMTs Under Repetitive Overvoltage Switching

过电压 超调(微波通信) 计算机科学 拓扑(电路) 电气工程 工程类 电压 电信
作者
Ruizhe Zhang,Ricardo Garcı́a,Robert Strittmatter,Yuhao Zhang,Shengke Zhang
出处
期刊:IEEE Transactions on Power Electronics [Institute of Electrical and Electronics Engineers]
卷期号:38 (9): 10589-10594 被引量:5
标识
DOI:10.1109/tpel.2023.3290117
摘要

Transient voltage overshoot is a common phenomenon in GaN high electron mobility transistors (HEMTs) under high slew rate switching conditions. The dynamic parametric instability under such stress is a critical concern for GaN applications. This work, for the first time, accurately characterized the evolution of dynamic on-resistance ( R DS(ON) ) in GaN HEMTs under repetitive voltage overshoot up to billions of switching cycles. The dynamic R DS(ON) increase was found to be the dominant device degradation under overvoltage switching. Such findings were obtained from a high-frequency, repetitive, unclamped inductive switching test with active temperature control and accurate in-situ R DS(ON) monitoring. A physics-based model was proposed to correlate the dynamic R DS(ON) drift with the peak overvoltage, and a good agreement with experimental data was achieved. This model was further used to project the lifetime of GaN HEMTs. For 100 V-rated GaN HEMTs switched under 100 kHz and 120 V spikes, the model projects less than 10% dynamic R DS(ON) shift over 25 years of continuous operation. This work addresses the major concerns of overvoltage switching reliability of GaN HEMTs and provides new insights into the electron trapping mechanism.

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