钴
镍
无机化学
水溶液
柠檬酸
化学
酒石酸
钨酸
氰化物
核化学
钨
物理化学
有机化学
出处
期刊:Journal of The Electrochemical Society
[The Electrochemical Society]
日期:1961-01-01
卷期号:108 (8): 767-767
被引量:6
摘要
A new solution formulation for the chemical (electroless) deposition of gold is proposed. The main constituents of this solution are potassium gold cyanide, citric acid or tartaric acid, tungstic acid, and N,N‐diethylglycine sodium salt. Optimum concentrations of these constituents were determined by a statistical evaluation of the solution at four concentration levels. Investigation of such variables as immersion time, solution temperature, and pH, which affect the chemical deposition of gold from solution, enabled determination of optimum operating conditions.
科研通智能强力驱动
Strongly Powered by AbleSci AI