材料科学
硅
光电子学
非晶硅
晶体硅
聚合物太阳能电池
氧化物薄膜晶体管
异质结
氧化物
纳米晶硅
氧化硅
薄脆饼
单晶硅
微晶
兴奋剂
太阳能电池
图层(电子)
纳米技术
化学
薄膜晶体管
冶金
结晶学
氮化硅
作者
Kaining Ding,Urs Aeberhard,F. Finger,Uwe Rau
标识
DOI:10.1002/pssr.201206030
摘要
Abstract This Letter reports on the fabrication and characterization of silicon heterojunction solar cells with silicon oxide based buffer (intrinsic amorphous silicon oxide) and contact layers (doped microcrystalline silicon oxide) on flat p‐type wafers. The critical dependency of the cell performance on the front and rear buffer layer thickness reveals a trade‐off between the open circuit voltage V oc and the fill factor FF. At the optimum, the highest efficiency of 18.5% (active area = 0.67 cm 2 ) was achieved with V oc = 664 mV, short circuit current J sc = 35.7 mA/cm 2 and FF = 78.0%. (© 2012 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)
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