钝化
碲化镉光电
异质结
外延
光电子学
材料科学
电介质
化学气相沉积
半导体
光电二极管
腐蚀坑密度
图层(电子)
纳米技术
蚀刻(微加工)
作者
G. Bahir,Viktor Ariel,V. Garber,Dana Rosenfeld,A. Sher
摘要
Results of experimental measurements and theoretical analysis are presented for the TiAu/ZnS/CdTe/HgCdTe metal–insulator–semiconductor heterostructure. The passivation of HgCdTe is provided by a double layer consisting of a dielectric ZnS placed on top of an epitaxial CdTe layer. Both HgCdTe and CdTe were grown by metalorganic chemical vapor deposition. Two types of CdTe layers were investigated: one was grown directly, in situ, immediately following the growth of HgCdTe; the second was grown indirectly using previously grown HgCdTe samples. It is shown that directly grown CdTe layers lead to low fixed interface charge, which is a good condition for passivation. The indirectly grown samples are still acceptable, but not as good as the directly grown samples. We demonstrate, on the basis of theoretical considerations, that the dielectric ZnS improves the flatband condition at the CdTe/HgCdTe interface.
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