High-speed deposition of graphite-like carbon film by Ar/C6H6 surface-wave plasma with high-voltage pulse biasing

A method for graphite-like carbon (GLC) deposition using Ar/C6H6 surface-wave plasma (SWP) is proposed. Characteristic of the SWP, i.e., high plasma density with wide spatial uniformity realized uniform carbon film deposition at high deposition rates. To increase sp2 ratio in carbon films, a pulsed negative bias voltage up to ~2 kV is applied to a substrate. Conductive carbon films of low sheet resistances below ~102 Ω/sq is achieved at high deposition rates up to ~6 nm/s with good spatial uniformity (±5%) in an area of ~18×3 cm2. Film structure is evaluated by Raman spectroscopy, Fourier-transform infra-red spectroscopy, X-ray diffraction, X-ray photoelectron spectroscopy, scanning transmission electron microscopy and electron energy loss spectroscopy. At high negative bias voltages, sp2-rich with reduced hydrogen content of the film is observed.