材料科学
钙钛矿(结构)
降级(电信)
氧化镍
镍
光电子学
溅射
太阳能电池
纳米技术
化学工程
工程物理
薄膜
冶金
电子工程
工程类
作者
Marion Dussouillez,Soo‐Jin Moon,Mounir Mensi,Christian Wolff,Yongpeng Liu,Jun‐Ho Yum,Brett A. Kamino,Arnaud Walter,Florent Sahli,Ludovic Lauber,Gabriel Christmann,Kevin Sivula,Quentin Jeangros,Christophe Ballif,Sylvain Nicolay,Adriana Paracchino
标识
DOI:10.1021/acsami.3c02709
摘要
The development of stable materials, processable on a large area, is a prerequisite for perovskite industrialization. Beyond the perovskite absorber itself, this should also guide the development of all other layers in the solar cell. In this regard, the use of NiOx as a hole transport material (HTM) offers several advantages, as it can be deposited with high throughput on large areas and on flat or textured surfaces via sputtering, a well-established industrial method. However, NiOx may trigger the degradation of perovskite solar cells (PSCs) when exposed to environmental stressors. Already after 100 h of damp heat stressing, a strong fill factor (FF) loss appears in conjunction with a characteristic S-shaped J-V curve. By performing a wide range of analysis on cells and materials, completed by device simulation, the cause of the degradation is pinpointed and mitigation strategies are proposed. When NiOx is heated in an air-tight environment, its free charge carrier density drops, resulting in a band misalignment at the NiOx/perovskite interface and in the formation of a barrier impeding hole extraction. Adding an organic layer between the NiOx and the perovskite enables higher performances but not long-term thermal stability, for which reducing the NiOx thickness is necessary.
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